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Cambridge NanoTech S200

eagle-i ID

http://eagle-i.itmat.upenn.edu/i/00000152-136a-719b-c297-b1a480000000

Resource Type

  1. Atomic layer deposition system

Properties

  1. Resource Description
    Savannah is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. The Penn Savannah is capable of holding substrates of different sizes (up to 200mm). It is equipped with six precursor lines for deposition of Al2O3, HfO2, TiO2, and SiO2. <img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/Cambridge-Nanotech-S200-300x225.jpg" alt="Cambridge NanoTech S200">
  2. Additional Name
    Savannah
  3. Manufacturer
    Ultratech/CambridgeNanotech
  4. Model Number
    Savannah 5200
  5. Website(s)
    http://www.nano.upenn.edu/resources/equipmentinstrumentation/
  6. Part of Collection
    Quattrone Nanofabrication Facility
  7. Location
    Singh Center for Nanotechnology (Penn)
 
RDFRDF
 
Provenance Metadata About This Resource Record
  1. workflow state
    Published
  2. contributor
    fcoldren
  3. created
    2016-01-05T15:16:22.498-05:00
  4. creator
    fcoldren
  5. modified
    2016-01-11T13:21:30.342-05:00

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The eagle-i Consortium is supported by NIH Grant #5U24RR029825-02 / Copyright 2016