Lesker PVD 75 3

eagle-i ID

Resource Type

Properties

1. Resource Description

   Load locked system Three DC guns Able to co-sputter two DC sources One RF gun Cryo pumped with automated interface Automated control of film thickness Pieces through 150mm wafers Wafer platen rotation with heating <img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/Lesker-PVD-75-3-225x300.jpg" alt="Lesker PVD 75 3">

2. Manufacturer

   Kurt J. Lesker Company

3. Model Number

   PVD 75

4. Website(s)

   http://www.nano.upenn.edu/resources/equipmentinstrumentation/

5. Part of Collection

   Quattrone Nanofabrication Facility

6. Location

   Singh Center for Nanotechnology (Penn)