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Anatech SCE 106

eagle-i ID

http://eagle-i.itmat.upenn.edu/i/00000152-320d-83d8-aeee-612f80000000

Resource Type

  1. Plasma etcher

Properties

  1. Resource Description
    Anatech USA’s SCE-100 Series Inductively Coupled (ICP) Plasma systems are extremely effective for a Plasma Ashing process to activate a surface prior to bonding PDMS, e.g. Process gases is O2. Sample sizes are pieces to 100mm round wafers. <img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/DE-01-225x300.jpg" alt="Anatech SCE 106">
  2. Manufacturer
    Anatech USA
  3. Model Number
    SCE 106
  4. Website(s)
    http://www.nano.upenn.edu/resources/equipmentinstrumentation/
  5. Part of Collection
    Quattrone Nanofabrication Facility
  6. Location
    Singh Center for Nanotechnology (Penn)
 
RDFRDF
 
Inferred Types from the eagle-i Ontology (What is an ontology?)
Provenance Metadata About This Resource Record
  1. workflow state
    Published
  2. contributor
    fcoldren
  3. created
    2016-01-11T13:59:39.095-05:00
  4. creator
    fcoldren
  5. modified
    2016-01-12T09:10:14.200-05:00
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