Anatech SCE 110

eagle-i ID

Resource Type

Properties

1. Resource Description

   Anatech USA’s SCE-100 Series Inductively Coupled (ICP) Plasma systems are extremely effective for a Plasma Ashing process to remove organics prior to thin film deposition and/or chemical analysis of remaining inorganics. Process gases are CF4, O2, Ar and N2. Sample sizes are pieces to 150mm round wafers. <img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/DE-02-225x300.jpg" alt="Anatech SCE 110">

2. Manufacturer

   Anatech USA

3. Model Number

   SCE 110

4. Website(s)

   http://www.nano.upenn.edu/resources/equipmentinstrumentation/

5. Part of Collection

   Quattrone Nanofabrication Facility

6. Location

   Singh Center for Nanotechnology (Penn)