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Anatech SCE 110
eagle-i ID
http://eagle-i.itmat.upenn.edu/i/00000152-320f-577f-aeee-612f80000000
Resource Type
Properties
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Resource Description
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Anatech USA’s SCE-100 Series Inductively Coupled (ICP) Plasma systems are extremely effective for a Plasma Ashing process to remove organics prior to thin film deposition and/or chemical analysis of remaining inorganics.
Process gases are CF4, O2, Ar and N2. Sample sizes are pieces to 150mm round wafers.
<img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/DE-02-225x300.jpg" alt="Anatech SCE 110">
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Manufacturer
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Anatech USA
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Model Number
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SCE 110
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Website(s)
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http://www.nano.upenn.edu/resources/equipmentinstrumentation/
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Part of Collection
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Quattrone Nanofabrication Facility
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Location
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Singh Center for Nanotechnology (Penn)
