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ABM 3000
eagle-i ID
http://eagle-i.itmat.upenn.edu/i/00000152-3241-251c-aeee-612f80000000
Resource Type
Properties
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Resource Description
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The 3000HR series Mask Aligner is high resolution, Contact/Proximity Aligner. The system offers precise and repeatable sub-micron alignment and exposure for many wafer and substrate sizes. This includes sensitive, brittle and odd shaped materials. The precision wedge-error compensation vacuum chucks offer consistent mask to substrate planarization for accurate separation adjustment and ease of alignment.
Specifications:
350 Watt UV Exposure System with Intensity Controlling Power Supply
365 nm Output Intensity – Approximately 20-25 mW/cm²
400 nm Output Intensity – Approximately 40-50 mW/cm²
Uniform/Collimated Beam Size: 5.0″ Diameter
Beam Uniformity: ± 3-5%
Adjustable Expose Timer: Adjustable from .1 to 999.9 Seconds
Nikon Single Field Binocular Microscope with 5x, 10x, & 20x Objectives, 10x Eyepieces, including Adjustable Coaxial Illuminator.
Stationary Mask Alignment Module with X,Y,Z, and Theta Motion
Electronic/Pneumatic Operator Control Panel
Top Load Vacuum Holders for 4” x 4 and ”5” x 5” Masks
Planarizing Vacuum Chuck for Piece Parts (up to 1” Diameter) & 4” Wafers
Z axis Adjustment: ±750 µm
Mask-to-Substrate Separation: settable in 10 µm increments
Front-side Alignment Accuracy: < 0.5 µ
Printing Resolution: Near UV < 0.8µm
<img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/MA-03v2-300x225.jpg" alt="ABM 3000">
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Additional Name
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AMB 3000HR Mask Aligner
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Manufacturer
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ABM, Inc.
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Model Number
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3000HR
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Website(s)
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http://www.nano.upenn.edu/resources/equipmentinstrumentation/
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Part of Collection
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Quattrone Nanofabrication Facility
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Location
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Singh Center for Nanotechnology (Penn)
