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Elionix ELS-7500EX
eagle-i ID
http://eagle-i.itmat.upenn.edu/i/00000152-324a-c336-aeee-612f80000000
Resource Type
Properties
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Resource Description
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Ultra-high precision lithography with a resolution of 10 nm and with high stitching and overlay accuracy.
Specifications
Electron gun emitter ZrO/W thermal field emitter
Acceleration voltage 50kV,30kV,20kV
Minimum line width 10nm
Specimen size 6″ (maximum)
Features
Ultra-fine lithography.
The 2-nm diameter spot beam allows the ultra fine pattern writing of 10 nm width. ELS-7500EX incorporates SEM function that serves for exposed pattern observation.
High stitching and overlay accuracy.
ELS-7500EX provides overlay accuracy of 30 nm that supports mix-and-match with photolithography.
The recipe function, with saved optimum beam settings, provides the ease of the operation.
The stage with a built-in laser interferometer and beam positioning resolution of 0.31 nm with an 18-bit DAC provide a stitching accuracy of 30 nm.
High performance with compact configuration. Ease of operation with PC control.
Integration of a Windows compatible GUI and CAD realizes a small footprint.
Electron optical condition control and CAD pattern design can be accomplished by simply using a mouse. A very user friendly system.
<img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/EBL-01v2-225x300.jpg" alt="Elionix ELS-7500EX">
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Manufacturer
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Elionix Inc.
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Model Number
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ELS-7500EX
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Website(s)
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http://www.nano.upenn.edu/resources/equipmentinstrumentation/
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Part of Collection
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Quattrone Nanofabrication Facility
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Location
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Singh Center for Nanotechnology (Penn)
