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Elionix ELS-7500EX

eagle-i ID


Resource Type

  1. Electron beam lithography system


  1. Resource Description
    Ultra-high precision lithography with a resolution of 10 nm and with high stitching and overlay accuracy. Specifications Electron gun emitter ZrO/W thermal field emitter Acceleration voltage 50kV,30kV,20kV Minimum line width 10nm Specimen size 6″ (maximum) Features Ultra-fine lithography. The 2-nm diameter spot beam allows the ultra fine pattern writing of 10 nm width. ELS-7500EX incorporates SEM function that serves for exposed pattern observation. High stitching and overlay accuracy. ELS-7500EX provides overlay accuracy of 30 nm that supports mix-and-match with photolithography. The recipe function, with saved optimum beam settings, provides the ease of the operation. The stage with a built-in laser interferometer and beam positioning resolution of 0.31 nm with an 18-bit DAC provide a stitching accuracy of 30 nm. High performance with compact configuration. Ease of operation with PC control. Integration of a Windows compatible GUI and CAD realizes a small footprint. Electron optical condition control and CAD pattern design can be accomplished by simply using a mouse. A very user friendly system. <img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/EBL-01v2-225x300.jpg" alt="Elionix ELS-7500EX">
  2. Manufacturer
    Elionix Inc.
  3. Model Number
  4. Website(s)
  5. Part of Collection
    Quattrone Nanofabrication Facility
  6. Location
    Singh Center for Nanotechnology (Penn)
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The eagle-i Consortium is supported by NIH Grant #5U24RR029825-02 / Copyright 2016