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Nanonex 2600 Nanoimprinter and Mask Aligner

eagle-i ID

http://eagle-i.itmat.upenn.edu/i/00000152-324d-b90c-aeee-612f80000000

Resource Type

  1. Mask aligner

Properties

  1. Resource Description
    The Nanonex NX-2600 is a full wafer nanoimprinter and photolithography aligner. It is capable of all imprint forms: thermal, photo-curable, embossing and photolithography, with sub-5nm imprinting resolution and sub-1 micrometer alignment accuracy. Based on the Nanonex unique patented Air Cushion PressTM technology, the NX-2600 offers unsurpassed uniformity regardless of backside topology, wafer or mask flatness, or backside contamination. This ACP technology also eliminates lateral shifting between the mask and substrate, which significantly increases mask lifetime. Standard nanoimprint resists are provided. Front and backside mask alignment. <img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/MA-04v2-225x300.jpg" alt="Nanonex 2600 Nanoimprinter and Mask Aligner">
  2. Additional Name
    Nanonex MA/BX NX2600
  3. Manufacturer
    Nanonex Corporation
  4. Model Number
    MA/BX NX-2600
  5. Website(s)
    http://www.nano.upenn.edu/resources/equipmentinstrumentation/
  6. Part of Collection
    Quattrone Nanofabrication Facility
  7. Location
    Singh Center for Nanotechnology (Penn)
 
RDFRDF
 
Provenance Metadata About This Resource Record
  1. workflow state
    Published
  2. contributor
    fcoldren
  3. created
    2016-01-11T15:10:26.664-05:00
  4. creator
    fcoldren
  5. modified
    2016-01-12T09:12:09.592-05:00

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The eagle-i Consortium is supported by NIH Grant #5U24RR029825-02 / Copyright 2016