Nanonex 2600 Nanoimprinter and Mask Aligner

eagle-i ID

Resource Type

Properties

1. Resource Description

   The Nanonex NX-2600 is a full wafer nanoimprinter and photolithography aligner. It is capable of all imprint forms: thermal, photo-curable, embossing and photolithography, with sub-5nm imprinting resolution and sub-1 micrometer alignment accuracy. Based on the Nanonex unique patented Air Cushion PressTM technology, the NX-2600 offers unsurpassed uniformity regardless of backside topology, wafer or mask flatness, or backside contamination. This ACP technology also eliminates lateral shifting between the mask and substrate, which significantly increases mask lifetime. Standard nanoimprint resists are provided. Front and backside mask alignment. <img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/MA-04v2-225x300.jpg" alt="Nanonex 2600 Nanoimprinter and Mask Aligner">

2. Additional Name

   Nanonex MA/BX NX2600

3. Manufacturer

   Nanonex Corporation

4. Model Number

   MA/BX NX-2600

5. Website(s)

   http://www.nano.upenn.edu/resources/equipmentinstrumentation/

6. Part of Collection

   Quattrone Nanofabrication Facility

7. Location

   Singh Center for Nanotechnology (Penn)