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YES Vapor Phase Deposition System

eagle-i ID

http://eagle-i.itmat.upenn.edu/i/00000152-325f-68ec-aeee-612f80000000

Resource Type

  1. Chemical vapor deposition system

Properties

  1. Resource Description
    While wet chemical surface modification can be done, vapor phase deposition has become the preferred method for coating surface as the process environment can be tightly controlled. Due to liquid surface tension, the wet process can have poor contact between the solution and the surface, especially when the surface is textured with small features. Another problem with wet processing, or solution phase deposition, is this process typically uses water. Standard recipes include HMDS priming and image reversal with ammonia chemistry. Other chemistry and related SAM coatings can be developed on request. <img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/OVN-01v2-225x300.jpg" alt="YES Vapor Phase Deposition System">
  2. Additional Name
    OVN - 1
  3. Manufacturer
    Yield Engineering Systems, Inc.
  4. Website(s)
    http://www.nano.upenn.edu/resources/equipmentinstrumentation/
  5. Part of Collection
    Quattrone Nanofabrication Facility
  6. Location
    Singh Center for Nanotechnology (Penn)
 
RDFRDF
 
Provenance Metadata About This Resource Record
  1. workflow state
    Published
  2. contributor
    fcoldren
  3. created
    2016-01-11T15:29:21.593-05:00
  4. creator
    fcoldren
  5. modified
    2016-01-12T09:10:47.596-05:00

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The eagle-i Consortium is supported by NIH Grant #5U24RR029825-02 / Copyright 2016