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Suss MicroTec AltaSpray Automated Spray Coated AS8

eagle-i ID

http://eagle-i.itmat.upenn.edu/i/00000152-3268-e570-aeee-612f80000000

Resource Type

  1. Instrument

Properties

  1. Resource Description
    Suss MicroTec AltaSpray Automated Spray Coated AS8 Automated Spray Coater for High Topographies SUSS MicroTec’s proprietary AltaSpray coating technology is a unique resist deposition method that is capable of producing highly uniform resist films on different 3-D microstructures. The AltaSpray technology is capable of coating 90° corners, KOH etched cavities, Through Silicon Vias (TSVs) or lenses with topographies ranging from a few micron to 600µm or more. The ability to produce conformal resist coatings on severe topography makes them the ideal choice for R&D, MEMS, 3D-Integration and Wafer Level Packaging applications like 3D image sensor packaging. Wafer sizes from pieces to 200mm. Common resists sprayed are SU-8, S1800 and various AZ formulations. <img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/RC-01v2-225x300.jpg" alt="Suss MicroTec AltaSpray Automated Spray Coated AS8">
  2. Additional Name
    RC-01
  3. Manufacturer
    S√úSS MicroTec AG
  4. Model Number
    AS8
  5. Website(s)
    http://www.nano.upenn.edu/resources/equipmentinstrumentation/
  6. Part of Collection
    Quattrone Nanofabrication Facility
  7. Location
    Singh Center for Nanotechnology (Penn)
 
RDFRDF
 
Provenance Metadata About This Resource Record
  1. workflow owner
    fcoldren
  2. workflow state
    Published
  3. contributor
    fcoldren
  4. created
    2016-01-11T15:39:52.502-05:00
  5. creator
    fcoldren
  6. modified
    2016-01-12T09:11:15.573-05:00

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