eagle-i The University of PennsylvaniaThe University of Pennsylvania
See it in Search
This page is a preview of the following resource. Continue onto eagle-i search using the button on the right to see the full record.

SUSS MicroTec MA-6

eagle-i ID


Resource Type

  1. Mask aligner


  1. Resource Description
    SUSS MicroTec MA-6 The Dedicated Solution for Industrial Research and Operator Assisted Alignment Designed for R&D, pilot line and production environments, the MA/BA6 Gen3 enables production-friendly research. It allows easy and cost effective process transfer from laboratory to production. Key components such as high resolution optics, precise alignment system and graphical user interface perfectly match with the SUSS production aligner platform. High resolution (HR) optics allows patterning of structures below 0.5μm Operator assisted and auto alignment permits down to 0.25μm alignment accuracy Advanced automatic functions for maximum process control Process compatibility with automatic equipment Optimized split field microscope with direct viewing and/or LCD flat screen options Allows utilization of tool sets from the previous MA/BA6 platform Pieces through 150mm wafers. <img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/MA-02v2-225x300.jpg" alt="SUSS MicroTec MA-6">
  2. Manufacturer
    S√úSS MicroTec AG
  3. Model Number
  4. Website(s)
  5. Part of Collection
    Quattrone Nanofabrication Facility
  6. Location
    Singh Center for Nanotechnology (Penn)
Provenance Metadata About This Resource Record
  1. workflow state
  2. contributor
  3. created
  4. creator
  5. modified
Copyright © 2016 by the President and Fellows of Harvard College
The eagle-i Consortium is supported by NIH Grant #5U24RR029825-02 / Copyright 2016