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SUSS MicroTec MA-6

eagle-i ID

http://eagle-i.itmat.upenn.edu/i/00000152-3272-3d3c-aeee-612f80000000

Resource Type

  1. Mask aligner

Properties

  1. Resource Description
    SUSS MicroTec MA-6 The Dedicated Solution for Industrial Research and Operator Assisted Alignment Designed for R&D, pilot line and production environments, the MA/BA6 Gen3 enables production-friendly research. It allows easy and cost effective process transfer from laboratory to production. Key components such as high resolution optics, precise alignment system and graphical user interface perfectly match with the SUSS production aligner platform. High resolution (HR) optics allows patterning of structures below 0.5μm Operator assisted and auto alignment permits down to 0.25μm alignment accuracy Advanced automatic functions for maximum process control Process compatibility with automatic equipment Optimized split field microscope with direct viewing and/or LCD flat screen options Allows utilization of tool sets from the previous MA/BA6 platform Pieces through 150mm wafers. <img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/MA-02v2-225x300.jpg" alt="SUSS MicroTec MA-6">
  2. Manufacturer
    S√úSS MicroTec AG
  3. Model Number
    MA-6
  4. Website(s)
    http://www.nano.upenn.edu/resources/equipmentinstrumentation/
  5. Part of Collection
    Quattrone Nanofabrication Facility
  6. Location
    Singh Center for Nanotechnology (Penn)
 
RDFRDF
 
Provenance Metadata About This Resource Record
  1. workflow state
    Published
  2. contributor
    fcoldren
  3. created
    2016-01-11T15:49:55.991-05:00
  4. creator
    fcoldren
  5. modified
    2016-01-12T09:11:22.227-05:00

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The eagle-i Consortium is supported by NIH Grant #5U24RR029825-02 / Copyright 2016