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Reynolds Tech Negative Photoresist Spinner Bench
eagle-i ID
http://eagle-i.itmat.upenn.edu/i/00000152-329f-81fa-aeee-612f80000000
Resource Type
Properties
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Resource Description
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This is a laminar flow bench with two spinners with rotation speeds from 1-10,000 RPM. Wafer sizes from pieces to 150mm. Solvent drains and nitrogen guns at each spinner station. PDMS can be spun in one of the spin station; the other station is typically used for SU-8, LOR and related negative resists.
<img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/WB-03v2-225x300.jpg" alt="Reynolds Tech Negative Photoresist Spinner Bench">
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Additional Name
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Bench 3
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Manufacturer
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ReynoldsTech
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Website(s)
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http://www.nano.upenn.edu/resources/equipmentinstrumentation/
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Part of Collection
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Quattrone Nanofabrication Facility
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Location
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Singh Center for Nanotechnology (Penn)
