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Reynolds Tech Negative Photoresist Spinner Bench

eagle-i ID

http://eagle-i.itmat.upenn.edu/i/00000152-329f-81fa-aeee-612f80000000

Resource Type

  1. Wet chemical bench

Properties

  1. Resource Description
    This is a laminar flow bench with two spinners with rotation speeds from 1-10,000 RPM. Wafer sizes from pieces to 150mm. Solvent drains and nitrogen guns at each spinner station. PDMS can be spun in one of the spin station; the other station is typically used for SU-8, LOR and related negative resists. <img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/WB-03v2-225x300.jpg" alt="Reynolds Tech Negative Photoresist Spinner Bench">
  2. Additional Name
    Bench 3
  3. Manufacturer
    ReynoldsTech
  4. Website(s)
    http://www.nano.upenn.edu/resources/equipmentinstrumentation/
  5. Part of Collection
    Quattrone Nanofabrication Facility
  6. Location
    Singh Center for Nanotechnology (Penn)
 
RDFRDF
 
Provenance Metadata About This Resource Record
  1. workflow state
    Published
  2. contributor
    fcoldren
  3. created
    2016-01-11T16:38:10.848-05:00
  4. creator
    fcoldren
  5. modified
    2016-01-12T09:10:58.490-05:00

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