Reynolds Tech Negative Photoresist Spinner Bench

eagle-i ID

Resource Type

Properties

1. Resource Description

   This is a laminar flow bench with two spinners with rotation speeds from 1-10,000 RPM. Wafer sizes from pieces to 150mm. Solvent drains and nitrogen guns at each spinner station. PDMS can be spun in one of the spin station; the other station is typically used for SU-8, LOR and related negative resists. <img src="http://www.nano.upenn.edu/wp-content/uploads/2014/09/WB-03v2-225x300.jpg" alt="Reynolds Tech Negative Photoresist Spinner Bench">

2. Additional Name

   Bench 3

3. Manufacturer

   ReynoldsTech

4. Website(s)

   http://www.nano.upenn.edu/resources/equipmentinstrumentation/

5. Part of Collection

   Quattrone Nanofabrication Facility

6. Location

   Singh Center for Nanotechnology (Penn)